Dr. Y.L. Jeyachandran, Assistant Professor (UGC-FRP) from the Department of Physics, and his research associate Dr. P. Peranantham were granted a patent for their research on developing a simple sol-gel procedure to produce high-quality ultra-thin silica films. The procedure is performed at a humidity level below 15%. The silica films produced as a result will have a thickness in the range of 3 to 30 nanometres at room temperature. This finding enables the deposition of ultra-thin silica films not only on silicon surfaces but on any solid surfaces and also on complex three-dimensional surfaces. This discovery can reduce the production cost of silica films in semiconductor and protective coating industries.